Fabrication and Characterization of p Type SnO Thin Film with High c Axis Prefer

We proposed a method to evaluate the material dispersion of the dielectric film in dielectriccoated

Distributed Bragg reflectors (DBRs) are essential components for the development of optoelectronic d

Beam quality degradation during the transition from a laser wakefield accelerator to the vacuum is o

All-electrical microwave characterization of high-speed optoelectronic devices with self-reference a

High-Repetition-Rate Dynamic Polarization Mode Dispersion Characterization Based on Linear Optical S

Ti修饰氧化钨纳米线薄膜的NO2敏感性能，秦玉香，刘凯轩，利用磁控溅射法在溶剂热合成的W18O49纳米线薄膜之上沉积Ti薄层并于350℃退火2h形成Ti修饰的氧化钨纳米线。研究了未修饰和Ti修饰的氧化

We experimentally demonstrate the application of MoSe2 thin film as a nonlinear medium and stabilize

Controllable fabrication of ternary ZnIn2S4 nanosheet array film for bulk heterojunction solar cells

Electrical characterization of Cu Schottky contacts to n-type GaAsN grown on (311)A/B GaAs substrate

磁控溅射制备高熵合金非晶薄膜,李建忱,朱建波,采用磁控溅射在Ar和O2气氛下制备了AlFeCoNiCuZrV多组元合金非晶薄膜。结果表明非晶薄膜的成分、组织和力学性能取决于氧的浓度。当氧浓�