Investigation on scalability of dual trench epitaxial diode for phase change mem
In this paper, the scalability of dual trench epitaxial diode as the selector for phase change memory (PCM).has been analyzed. The 4 F2 diode with active area of 0.002916 mm2 has been fabricated using the standard.40 nm complementary metal oxide semiconductor process. The ratio of disturbance curren
暂无评论