Fabrication and measurement of optical characterization of one dimensional photo

Numerical calculations based on the transfer matrix method are carried out, and the results of band gap with resonance peaks are obtained. The electron beam lithography technology (EBL) and induction coupling plasma (ICP) etching are used to make the photonic crystal (PC) structures, and from several scanning electron microscope images, the PC structures are observed with features closing to the design. In order to create the tiny PC structures in the right places of the waveguide by the EBL tec