Novel chemically amplified resists incorporating anionic species represent a cutting-edge technology in the current field of materials science. These resists, based on anionic compounds, exhibit outstanding performance and significant potential applications. The introduction of anionic species imparts unique characteristics to these chemically amplified resists in material preparation and micro-nano fabrication. The incorporation of anions not only enhances the chemical stability of the materials but also improves their corrosion resistance, making them excel in extreme environments. Researchers have successfully developed a series of chemically amplified resists with innovative structures through in-depth experiments and theoretical studies, providing new possibilities for the advancement of microelectronic devices and photolithography technology.