The second edition of this volume is written not only as an introduction to the science and technology of microlithography, but also as a reference for those who with more experience so that they may obtain a wider knowledge and a deeper understanding of the field. The purpose of this update remains consistent with the first edition published in 1998 and edited by Dr. James R. Sheats and Dr. Bruce W. Smith. New advances in lithography have required that we update the coverage of microlithography systems and approaches, as well a s resist materials, processes, and metrology techniques. s resist materials, processes, and metrology techniques.