illumination optics design for EUV lithography A condenser for a ring-field extreme ultra-violet (EUV) projection lithography camera is presented. The condenser consists of a gently undulating mirr
Fabrication of a complexshaped mirror Weproposeanddiscussseveralfabricationprocessesforacomplex-shapedmirror,whichisafly-eyemirror,usedinanextremeultravioletlithography(EUVL)illuminationsy