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illumination optics design for EUV lithography
A condenser for a ring-field extreme ultra-violet (EUV) projection lithography camera is presented. The condenser consists of a gently undulating mirr
讲义 18 0 PDF 2021-04-19 08:04:55
Fabrication of a complexshaped mirror
Weproposeanddiscussseveralfabricationprocessesforacomplex-shapedmirror,whichisafly-eyemirror,usedinanextremeultravioletlithography(EUVL)illuminationsy
讲义 29 0 pdf 2019-09-04 02:09:37